Transparent electrodes based on ultra-thin dielectric-metal-dielectric multilayer structures
Tutor / Supervisor
Student
Ros Costals, Eloi
Document type
Master thesis
Date
2019
rights
Open Access
Publisher
Universitat Politècnica de Catalunya
UPCommons
Abstract
Photonics has been the focus of an increasing ammount of resarch resources and founding since technological demands of solutions to complex problems can be solved within its scope. In this paper we will specifically focus on the demand of Transparent Conductive Materials in an specific field of photonics (i.e. opto-electronics). Particularly, we are going to fabricate and caracterize thin film stacks called DMD (i.e. Dielectric Metal Dielectric), and using simulations as a guide we will integrate this materials inside electronic devices (i.e. Silicon solar cells). The devices will use a combination Transition Metal Oxides (e.g. V2O5, MoO3) for the dielectric layers, and soft metals (Ag, Au, Al) deposited either by thermal Evaporation or Sputtering. Several ideas regarding the coalescence thickness of metallic thin films, which represents a limiting factors of this technology are tested in this work, achieving an enhancement of optical and electrical properties
